This overview presents references to original publication on the electrochemical deposition of metals in ionic liquids.
The following table is ordered alphabetically by chemical element names (column 1). In the cited literature,
the given element plays the role of the electrodeposit, typically as a layer or thin film on various substrates
(column 3). An ionic liquid or a mixture thereof is the electrolyte medium (column 2). The short notations,
used for ions are explained in the Glossary and elsewhere in more detail for
cations
and
anions.
In addition, precursor
compounds of the deposited element are listed (column 4).
Deposit |
Electrolyte |
Substrates |
Notes |
Reference |
Cobalt (Co) |
[1Bu3MeIm][BF4] |
Au(111) |
Precursor: CoCl2, Co(BF4)2 |
[JExpNano2006a] |
|
[1Bu1MePL][Tf2N] |
Cu, Pt |
Precursor: Co(Tf2N)2 |
[JES2007a] |
|
[1Bu3MeIM][Tf2N] |
glass |
Precursor: CoCl2 |
[ESSL2007a] |
Cadmium (Cd) |
[1Et3MeIM][Cl/BF4] |
glassy carbon, pc-W, Pt |
Precursor: CdCl2/[CdCl4]2- |
[EA2000a] |
Copper (Cu) |
[1Bu1MePL][Tf2N] |
Au |
Precursor: Cu(I) from anodic dissolution |
[EA2006a] |
Indium (In) |
[1Bu1MePL][Tf2N] |
glassy carbon, pc-Pt |
Precursor: InCl3 |
[EA2006a] |
Manganese (Mn) |
[1Bu1MePL][Tf2N] |
Pt, W |
Precursor: Mn(II) from anodic dissolution |
[EA2007a] |
Selenium (Se) |
[1Bu1MePL][Tf2N] |
Pt |
Precursor: SeCl4; |
[EA2006a] |
Silicon (Si) |
[1Bu1MePL][Tf2N] |
HOPG |
Precursor: SiCl4 |
[EC2004a] |
|
[1Bu1MePL][Tf2N] |
Au(111) |
Precursor: SiCl4 |
[JPCB2006a] |
Silver (Ag) |
[1Et3MeIM][BF4] |
Pt |
Precursor: AgBF4 |
[JES2001a] |
Tantalum (Ta) |
[1Bu1MePL][Tf2N] |
pc-Pt, Au(111) |
Precursor: TaF5 |
[PCCP2005a] |
|
[1Bu1MePL][Tf2N] |
pc-Au, Au(111) |
Precursor: TaF5 |
[EA2008a] |
Tin (Sn) |
[1Et3MeIM][Cl]/AlCl3 |
Au |
Precursor: SnCl2, SnCl4 |
[JES1993a] |
Zinc (Zn) |
[1Et3MeIM][Cl]/AlCl3 |
pc-Au, Pt, W, glassy carbon |
Precursor: Zn(II) from anodic dissolution |
[JES1997a] |
Glossary
1Bu1MePL |
1-butyl-1-methylpyrrolidinium |
1Et3MeIM |
1-ethyl-3-methylimidazolium |
HOPG |
highly oriented pyrolytic graphite |
pc |
polycrystalline |
Tf2N |
bis(trifluoromethylsulfonyl)amide |
References:
[EA2000a] |
Po-Yu Chen and I-Wen Sun:
Electrochemistry of Cd(II) in the basic 1-ethyl-3-methylimidazolium chloride/tetrafluoroborate
room temperature molten salt Electrochim. Acta
2000, 45, 3163-3170. DOI:
10.1016/S0013-4686(00)00476-X.
|
[EA2006a] |
S. Zein el Abedin, A. Y. Saad, H. K. Farag, N. Borisenko, Q. X. Liu and F. Endres:
Electrodeposition of selenium, indium and copper in an air- and water-stable ionic liquid
at variable temperatures Electrochim. Acta
2006, 52, 2746-2754. DOI:
10.1016/j.electacta.2006.08.064.
|
[EA2007a] |
Ming-Jay Deng, Po-Yu Chen and I-Wen Sun:
Electrochemical study and electrodeposition of manganese in the hydrophobic butylmethylpyrrolidinium
bis((trifluoromethyl)sufonyl)imide room-temperature ionic liquid Electrochim. Acta
2007, 53, 1931-1938. DOI:
10.1016/j.electacta.2007.08.047.
|
[EA2008a] |
N. Borisenko, A. Ispas, E. Zschippang, Q. Liu,
S. Zein el Abedin, A. Bund and F. Endres:
In situ STM and EQCM studies of tantalum electrodeposition from TaF5 in the
air- and water-stable ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide
Electrochim. Acta
2008, in press. DOI:
10.1016/j.electacta.2008.09.042.
|
[EC2004a] |
S. Zein el Abedin, N. Borisenko and F. Endres:
Electrodeposition of nanoscale silicon in a room temperature ionic liquid Electrochem. Commun.
2004, 6, 510-514. DOI:
10.1016/j.elecom.2004.03.013.
|
[ESSL2007a] |
S. Schaltin, P. Nockemann, B. Thijs, K. Binnemans and J. Fransaer:
Influence of the Anion on the Electrodeposition of Cobalt from Imidazolium Ionic Liquids
Electrochememical and Solid-State Letters
2007, 10, D104-D107. DOI:
10.1149/1.2760185.
|
[JES1993a] |
X.-H. Xu and C. L. Hussey:
The Electrochemistry of Tin in the Aluminum Chloride - 1-Methyl-3-ethylimidazolium Chloride Molten Salt
J. Electrochem. Soc.
1993, 140, 618-626.
|
[JES1997a] |
W. R. Pitner and C. L. Hussey:
Electrodeposition of Zinc from the Lewis Acidic Aluminum Chloride - 1-Methyl-3-ethylimidazolium
Chloride Room Temperature Molten Salt
J. Electrochem. Soc.
1997, 144, 3095-3103.
|
[JES2001a] |
Y. Katayama, S. Dan, T. Miura and T. Kishi:
Electrochemical Behavior of Silver in 1-Ethyl-3-methylimidazolium Tetrafluoroborate Molten Salt
J. Electrochem. Soc.
2001, 148, C102-C105. DOI:
10.1149/1.1341243.
|
[JES2007a] |
Y. Katayama, R. Fukui and T. Miura:
Electrodeposition of Cobalt from an Imide-Type Room-Temperature Ionic Liquid
J. Electrochem. Soc.
2007, 154, D534-D537. DOI:
10.1149/1.2768298.
|
[JExpNano2006a] |
L.-G. Lin, J.-W. Yan, Yu Wang, Y.-C. Fu and B.-W. Mao:
An in situ STM study of cobalt electrodeposition on Au(111) in BMIBF4 ionic liquid
Journal of Experimental Nanoscience
2006, 1, 269-278. DOI:
10.1080/17458080601009643.
|
[JPCB2006a] |
N. Borisenko, S. Zein el Abedin and F. Endres:
In Situ STM Investigation of Gold Reconstruction and of Silicon Electrodeposition on Au(111) in
the Room Temperature Ionic Liquid 1-Butyl-1-methylpyrrolidinium Bis(trifluoromethylsulfonyl)imide
J. Phys. Chem. B
2006, 110, 6250-6256. DOI:
10.1021/jp057337d.
|
[PCCP2005a] |
S. Zein el Abedin, H. K. Farag, E. M. Moustafa, U. Welz-Biermann and F. Endres:
Electroreduction of tantalum fluoride in a room temperature ionic liquid at variable temperatures
Phys. Chem. Chem. Phys.
2005, 7, 2333-2339. DOI:
10.1039/b502789f.
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