Electrodeposition of metals and semiconductors in ionic liquids:
a literature overview

Contribution from Axel's Collection of Notes and Communications
by Axel Drefahl • www.axeleratio.com

This overview presents references to original publication on the electrochemical deposition of metals in ionic liquids. The following table is ordered alphabetically by chemical element names (column 1). In the cited literature, the given element plays the role of the electrodeposit, typically as a layer or thin film on various substrates (column 3). An ionic liquid or a mixture thereof is the electrolyte medium (column 2). The short notations, used for ions are explained in the Glossary and elsewhere in more detail for cations and anions. In addition, precursor compounds of the deposited element are listed (column 4).

Deposit Electrolyte Substrates Notes Reference
Cobalt (Co) [1Bu3MeIm][BF4] Au(111) Precursor: CoCl2, Co(BF4)2 [JExpNano2006a]
[1Bu1MePL][Tf2N] Cu, Pt Precursor: Co(Tf2N)2 [JES2007a]
[1Bu3MeIM][Tf2N] glass Precursor: CoCl2 [ESSL2007a]
Cadmium (Cd) [1Et3MeIM][Cl/BF4] glassy carbon, pc-W, Pt Precursor: CdCl2/[CdCl4]2- [EA2000a]
Copper (Cu) [1Bu1MePL][Tf2N] Au Precursor: Cu(I) from anodic dissolution [EA2006a]
Indium (In) [1Bu1MePL][Tf2N] glassy carbon, pc-Pt Precursor: InCl3 [EA2006a]
Manganese (Mn) [1Bu1MePL][Tf2N] Pt, W Precursor: Mn(II) from anodic dissolution [EA2007a]
Selenium (Se) [1Bu1MePL][Tf2N] Pt Precursor: SeCl4; [EA2006a]
Silicon (Si) [1Bu1MePL][Tf2N] HOPG Precursor: SiCl4 [EC2004a]
[1Bu1MePL][Tf2N] Au(111) Precursor: SiCl4 [JPCB2006a]
Silver (Ag) [1Et3MeIM][BF4] Pt Precursor: AgBF4 [JES2001a]
Tantalum (Ta) [1Bu1MePL][Tf2N] pc-Pt, Au(111) Precursor: TaF5 [PCCP2005a]
[1Bu1MePL][Tf2N] pc-Au, Au(111) Precursor: TaF5 [EA2008a]
Tin (Sn) [1Et3MeIM][Cl]/AlCl3 Au Precursor: SnCl2, SnCl4 [JES1993a]
Zinc (Zn) [1Et3MeIM][Cl]/AlCl3 pc-Au, Pt, W, glassy carbon Precursor: Zn(II) from anodic dissolution [JES1997a]


Glossary

1Bu1MePL 1-butyl-1-methylpyrrolidinium
1Et3MeIM 1-ethyl-3-methylimidazolium
HOPG highly oriented pyrolytic graphite
pc polycrystalline
Tf2N bis(trifluoromethylsulfonyl)amide


References:

[EA2000a] Po-Yu Chen and I-Wen Sun: Electrochemistry of Cd(II) in the basic 1-ethyl-3-methylimidazolium chloride/tetrafluoroborate room temperature molten salt Electrochim. Acta 2000, 45, 3163-3170. DOI: 10.1016/S0013-4686(00)00476-X.
[EA2006a] S. Zein el Abedin, A. Y. Saad, H. K. Farag, N. Borisenko, Q. X. Liu and F. Endres: Electrodeposition of selenium, indium and copper in an air- and water-stable ionic liquid at variable temperatures Electrochim. Acta 2006, 52, 2746-2754. DOI: 10.1016/j.electacta.2006.08.064.
[EA2007a] Ming-Jay Deng, Po-Yu Chen and I-Wen Sun: Electrochemical study and electrodeposition of manganese in the hydrophobic butylmethylpyrrolidinium bis((trifluoromethyl)sufonyl)imide room-temperature ionic liquid Electrochim. Acta 2007, 53, 1931-1938. DOI: 10.1016/j.electacta.2007.08.047.
[EA2008a] N. Borisenko, A. Ispas, E. Zschippang, Q. Liu, S. Zein el Abedin, A. Bund and F. Endres: In situ STM and EQCM studies of tantalum electrodeposition from TaF5 in the air- and water-stable ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide Electrochim. Acta 2008, in press. DOI: 10.1016/j.electacta.2008.09.042.
[EC2004a] S. Zein el Abedin, N. Borisenko and F. Endres: Electrodeposition of nanoscale silicon in a room temperature ionic liquid Electrochem. Commun. 2004, 6, 510-514. DOI: 10.1016/j.elecom.2004.03.013.
[ESSL2007a] S. Schaltin, P. Nockemann, B. Thijs, K. Binnemans and J. Fransaer: Influence of the Anion on the Electrodeposition of Cobalt from Imidazolium Ionic Liquids Electrochememical and Solid-State Letters 2007, 10, D104-D107. DOI: 10.1149/1.2760185.
[JES1993a] X.-H. Xu and C. L. Hussey: The Electrochemistry of Tin in the Aluminum Chloride - 1-Methyl-3-ethylimidazolium Chloride Molten Salt J. Electrochem. Soc. 1993, 140, 618-626.
[JES1997a] W. R. Pitner and C. L. Hussey: Electrodeposition of Zinc from the Lewis Acidic Aluminum Chloride - 1-Methyl-3-ethylimidazolium Chloride Room Temperature Molten Salt J. Electrochem. Soc. 1997, 144, 3095-3103.
[JES2001a] Y. Katayama, S. Dan, T. Miura and T. Kishi: Electrochemical Behavior of Silver in 1-Ethyl-3-methylimidazolium Tetrafluoroborate Molten Salt J. Electrochem. Soc. 2001, 148, C102-C105. DOI: 10.1149/1.1341243.
[JES2007a] Y. Katayama, R. Fukui and T. Miura: Electrodeposition of Cobalt from an Imide-Type Room-Temperature Ionic Liquid J. Electrochem. Soc. 2007, 154, D534-D537. DOI: 10.1149/1.2768298.
[JExpNano2006a] L.-G. Lin, J.-W. Yan, Yu Wang, Y.-C. Fu and B.-W. Mao: An in situ STM study of cobalt electrodeposition on Au(111) in BMIBF4 ionic liquid Journal of Experimental Nanoscience 2006, 1, 269-278. DOI: 10.1080/17458080601009643.
[JPCB2006a] N. Borisenko, S. Zein el Abedin and F. Endres: In Situ STM Investigation of Gold Reconstruction and of Silicon Electrodeposition on Au(111) in the Room Temperature Ionic Liquid 1-Butyl-1-methylpyrrolidinium Bis(trifluoromethylsulfonyl)imide J. Phys. Chem. B 2006, 110, 6250-6256. DOI: 10.1021/jp057337d.
[PCCP2005a] S. Zein el Abedin, H. K. Farag, E. M. Moustafa, U. Welz-Biermann and F. Endres: Electroreduction of tantalum fluoride in a room temperature ionic liquid at variable temperatures Phys. Chem. Chem. Phys. 2005, 7, 2333-2339. DOI: 10.1039/b502789f.



Last update was made on December 1 in 2008 by Axel Drefahl
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